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Products
PL-T
Desktop Pneumatic
(NIL) System
PL-MR
Hybrid Roller-Based (NIL) System
PL-S
Vacuum-Pneumatic
(NIL) System
PL-AS
Wafer-Scale Semiconductor-Grade (NIL) System
PL-R
Mass-Production Roll-to-Roll （NIL） System
PL-P
High-Precision Plate-to-Plate (NIL) System
PL-SR
Inkjet Step-and-Repeat (NIL) System
PL-A
Full-Automatic Pneumatic (NIL) System
Nanoimprint Lithography (NIL) Equipment
A nanoimprint lithography (NIL) system is a specialized device that utilizes precision mechanical imprinting and curing processes to replicate nanoscale patterns from a template onto a resist-coated substrate, enabling high-resolution, low-cost nanostructure fabrication.
As a breakthrough alternative to optical lithography, NIL overcomes the resolution limitations of traditional photolithography and serves as a critical tool for advancing nanotechnology in semiconductor, photonics, and biomedical applications.
NIL Process Development
Nanoimprint materials (NIL resists) serve the same fundamental purpose as photoresists in lithography - replicating microscopic patterns from templates to substrates through mechanical imprinting rather than optical exposure.
The nanoimprint process represents a complete application-specific system integrating imprint methodology selection and material optimization - collectively known as 'process know-how' .
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Nanoimprint technology demands a closed-loop ecosystem of equipment, materials, and processes.
PRINANO combines decades of expertise in NIL systems, plus 20+ years in materials and process innovation.
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