Template Adhesive
Etching Resist
​​Optical Resists
Bio Resists
​​Supporting Materials
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PL-R-UPM Working Template Adhesive
PL-R-UPM is a low-surface-energy, fluorine-containing UV-curable working stamp resist that enables precise replication of source template nanostructures with adjustable film thickness and Young's modulus, achieving <10 nm resolution and >96% transmittance. Compatible with commercial coating and imprinting equipment, it can be directly integrated into existing industrial processes, making it ideal for fabricating superhydrophobic structures or nanoimprint working stamps.​

PL - R - RM  Template Replication Material

PL-R-PC1000/1010/1020
Oxygen Plasma-Resistant Nanoimprint Resist​
The PL-R-PC1000/1010/1020 series are oxygen plasma-resistant UV nanoimprint resists featuring <7nm resolution, >200°C stability, and >40:1 etch selectivity. With tunable thickness and 1.48-1.49 refractive index, they serve as hard masks for semiconductor patterning while integrating seamlessly with industrial processes.
PL-R-PC2000​​Fluorine/Chlorine Plasma-Resistant Nanoimprint Resist​
PL-R-PC2000 is a fluorine/chlorine-resistant UV nanoimprint resist forming 800MPa hard masks (RI 1.53) with <7nm resolution. Its 1:0.8-1:1 etch selectivity enables direct patterning of compound semiconductors, Al gratings and Si lenses, with full industrial compatibility.
PL - R - UL1000/2000 Transfer Layer Material
This series offers oil-soluble (UL1000-O) and water-soluble (UL1000-W) lift-off layers forming uniform films (RI 1.49, <±2nm). These dual-function materials serve as adhesion layers and transfer media, enabling residue-free removal - UL1000-O with anisole, UL1000-W with water/solvents. Fully compatible with standard equipment, they integrate seamlessly into industrial processes.
PL - R - DHR Composite-Doped Nanoimprint Resists (RI 1.7–1.9)​
This series comprises ​​UV-curable nanoimprint optical adhesives​​ with ​​engineered refractive index gradients​​ (1.70→1.80→1.90 @589 nm), enabling ​​high-transparency (>92%)​​, ​​low-haze (<0.02%)​​ micro/nanostructures post-imprint. Designed for ​​AR waveguides​​ and ​​automotive HUD optics​​, these materials are ​​fully compatible​​ with commercial coating/imprinting equipment and ​​seamlessly integrate​​ into existing industrial workflows.
PL - R - O/OP (1.3 & 1.5) Organic Optical Adhesives

PRINANO offers two UV-curable optical nanoimprint resists: ​​O1340​​ with ultra-low refractive index (1.34 @589nm, Abbe 71) for >96% transmittance micro-lenses, and ​​O1500​​ (1.506 @589nm, Abbe 49) delivering >98% transmittance and high-resolution patterns. Both are compatible with standard coating/imprinting equipment for industrial integration.

PL - R - LS001 Low - shrinkage Nanoimprint Resins
This low-distortion UV-curable nanoimprint resin enables 0.5% shrinkage in millimeter-scale structures for micro-lenses, DOEs and AR waveguides, offering <100nm resolution, >95% transmittance, and 300-800MPa tunable modulus while resisting oxygen inhibition. Compatible with standard coating/imprinting equipment, it integrates into 300mm wafer and R2R production.​
PL - R - B1000 Low - fluorescence UV Nanoimprint Resin
A ​​low-fluorescence UV-curable resist​​ specifically engineered for biomedical applications, enabling high-precision ​​microfluidic channels​​ and ​​sequencing microstructures​​ on substrates. Features ​​1.52 refractive index​​, ​​97% transmittance​​, and ​​<0.01% haze​​, with hydroxylatable surfaces for enhanced biocompatibility. Fully compatible with commercial ​​coating/imprinting equipment​​ for seamless industrial integration.
PL - R - DR001 Degradable UV Nanoimprint Resin
A ​​spray-/spin-coatable UV resist​​ that forms ​​high-modulus, 1.52 RI nanostructures (<10 nm resolution)​​, uniquely degradable via ​​3-min mild acid hydrolysis​​ for ​​residue-free​​ template/substrate cleaning. Extends template lifespan ​​10x+​​ and reduces rework costs. Fully compatible with standard ​​coating/imprinting tools​​ for industrial adoption.
PL - R - AP Adhesive - Enhancing Material
PL-R-AP1000 and PL-R-AP2000 are molecular-thick adhesion promoters: AP1000 enhances resist spreading and adhesion on silicon/quartz substrates via spin-coating and baking, while AP2000 strengthens metal-inorganic interfaces when applied before metallization/electroplating, improving both metal-substrate bonding and resist adhesion. Both are compatible with commercial coating/imprinting equipment for seamless industrial integration.
PL-R-AT Anti-sticking Material
PL-R-AT is a molecular-scale anti-adhesion agent that forms <2 nm hydrophobic films (water contact angle >110°) on oxide surfaces via 80°C vapor deposition (4h), significantly reducing surface energy for easier demolding, with full compatibility to commercial coating/imprinting equipment for direct industrial integration.
PL-R-TS001 High-Temperature-Resistant Nanoimprint Adhesive
PL-R-TS001 is a high-temperature nanoimprint resist with excellent oxygen inhibition resistance and thermal stability, demonstrating only 3% weight loss at 365°C (TGA verified), making it ideal for high-temperature applications. It forms thermally stable micro/nanostructures with 2.5 GPa Young's modulus, 1.49 refractive index, and >95% transmittance, while maintaining full compatibility with commercial coating/imprinting equipment for seamless industrial integration.
NIL Equipment
NIL Process Development
Nanoimprint equipment is essential for nanoimprint processes, featuring plate-to-plate, pneumatic, and roller-based pressure systems, along with UV or thermal curing options.​
The nanoimprint process represents a complete application-specific system integrating imprint methodology selection and material optimization - collectively known as 'process know-how' .
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The closed - loop of nanoimprint technology includes many aspects such as nanoimprint equipment, materials, and processes. Pu Lin Technology not only has years of experience in the equipment field but also has more than two decades of practical experience in materials and processes.
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