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PL-T Desktop Pneumatic (NIL) System​
PL - S Vacuum-Pneumatic  (NIL) System
PL-MR Hybrid Roller-Based  (NIL) System
<5nm Resolution
<5nm
Resolution
<20nm
resolution
Fully Automated Throughout the Whole process
Simple to Operate
Max. 12 inches
Max. 12 inches
Fully Automated Throughout the Process
＞99.5% Uniformity
Equipment Introduction
Equipment Introduction
Equipment Introduction
Related Products
Imprint Cases
Imprint Cases
Imprint Cases
＞99.5% Uniformity
< UV + Thermal Imprinting​
Fully Automated Throughout the Process
​​The PL-T Nanoimprint System​​ is a benchtop multi-functional nanoimprint system primarily designed for universities and laboratories, capable of performing thermal curing, UV curing, and thermoplastic nanoimprinting with a maximum imprint size of 4 inches. ​​The PL-T system​​ incorporates PRINANO's core patented technology that controls full-wafer imprint uniformity error within 0.5%, while achieving ultra-high resolution pattern replication and transfer below 5nm. ​​The PL-T system​​ offers the advantages of lightweight design, user-friendly operation, and high performance, making it highly favored by users. Our clientele includes the University of Southern California, Nanyang Technological University, University of Waterloo, Tsinghua University, Shanghai Jiao Tong University, and the Chinese Academy of Sciences, among others.

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The ​​PL-MR is a ​​gravity-assisted roller nanoimprinting system​​ developed by PRINANO, which utilizes rolling pressure to bond flexible stamps with substrates. It supports ​​up to 12-inch wafer-scale imprinting​​.


​​Roller nanoimprinting technology​​ was first proposed in ​​1998 by Prof. Stephen Y. Chou​​ (inventor of nanoimprint lithography), originally developed for ​​wafer-scale surface material patterning​​. Today, it has become the ​​dominant method for manufacturing AR waveguide lenses​​.


The ​​PL-MR system​​ features:

• ​​​​Simple operation​​ and ​​straightforward working principle​​

•​​ ​​Ultra-large-area imprinting​​ capability (​​1.3 × 1.1 m²​​)

•​​ ​​High-throughput continuous processing​


​The PL-S​​ represents PRINANO's upgraded ​​desktop vacuum-pneumatic nanoimprint system​​, capable of ​​12-inch wafer-scale imprinting​​. It supports both ​​thermal curing and UV curing​​, while achieving ​​<1 minute full imprint process cycle time​​.

​​The PL-S system​​ incorporates PRINANO's core patented technology, controlling ​​full-wafer imprint uniformity error within 0.5%​​ and enabling ​​ultra-high-resolution pattern replication below 5nm​​.


​​The PL-S system​​ offers ​​multiple advantages​​ for:

•​​ Small-batch production​​
•​​ Pre-mass-production R&D verification​​
•​​ Advanced research platform construction
More Information
NIL Process Video
 NIL Process Video
NIL Process Video
More Information
More Information
PL-P
High-Precision Plate-to-Plate (NIL) System​
PL-A
Full-Automatic Pneumatic (NIL) System
PL-SR
Inkjet Step-and-Repeat (NIL) System​