​​The PL-P nanoimprint system is specifically designed for micro-scale structures such as cylindrical lenses and microlens arrays, featuring high automation and mass-production capabilities. Utilizing a dual-leveling system combining optical and mechanical sensors, it achieves leveling accuracy ≤0.5μm across 8-inch substrates while ensuring high residual layer uniformity. With alignment precision ≤±1μm, the system offers an optional TSM infrared light source for double-sided alignment of opaque materials like silicon wafers. Additionally, its built-in high-precision dispensing system minimizes manual operations, significantly improving imprinting stability.

To better serve diverse customer needs, we provide customized special functionalities upon request.​