The PL-SR is a versatile step-and-repeat nanoimprinting lithography system that delivers highly efficient and precise imprinting capabilities, with additional advanced pattern-stitching functionality.

The PL-SR employs a high-precision inkjet dispensing system for resist deposition while incorporating precision alignment technology capable of achieving nanoimprinting processes with <200nm alignment accuracy. Furthermore, the PL-SR step-and-repeat imprinting system can fulfill template stitching requirements, seamlessly joining imprint templates as small as 20mm×20mm to ultimately achieve ultra-large-area patterning on 300mm (12-inch) wafers.

The PL-SR represents China's first inkjet-based step-and-repeat nanoimprinting system, and remains the only domestic equipment currently capable of supporting advanced chip R&D with sub-20nm process nodes.

The PL-SR also possesses high-end semiconductor manufacturing capabilities. Its inkjet dispensing system enables optimal control of resist volume for variable-period nanostructures while simultaneously addressing the critical challenge of residual layer control in structures with non-uniform pattern densities. The system achieves exceptional alignment accuracy of <50nm, and an enhanced high-configuration PL-SR model optimized specifically for these demanding applications is currently under active development - stay tuned for updates.