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PL - R Mass-Production Roll-to-Roll （NIL） System
<50nm
Resolution
<20nm
Residual Layer
≥30WPH*
Wafers Per Hour
<3μm
Alignment Accuracy
The PL - R is a high - precision gravity roller - type nanoimprint system, which can achieve a nanoimprint process with a resolution of less than 50nm and a double - sided alignment accuracy of <3μm;
Equipment Introduction
Equipment Video
Related Products
The PL-R series nanoimprint system is a roller-based nanoimprinting equipment designed for wafer-level pilot production and mass manufacturing, featuring high throughput, full automation, and user-friendly operation. Utilizing gravity-assisted rollers, the PL-R precisely controls pressure deviations during the conformal contact between flexible stamps and substrates, achieving full-wafer residual layer thickness <20nm in specific processes.
Additionally, to address diverse imprinting requirements—particularly in diffractive waveguide (AR) applications—the system offers double-sided alignment capability with <3μm precision.
Process Demonstration Video
Equipment Working Video
PL-A
Full-Automatic Pneumatic (NIL) System
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