The ​​PL-A​​ is a ​​nanoimprint system​​ specifically designed for ​​wafer-scale pilot production and industrial mass manufacturing​​. This system offers ​​high throughput, ultra-high resolution, full automation, and user-friendly operation​​.

The ​​PL-A system​​ incorporates PRINANO's proprietary ​​dual-chamber vacuum-pneumatic nanoimprint technology​​, combined with patented ​​SFP & Hybird Mold® imprinting technology​​. It ensures ​​<0.5% pressure uniformity error​​ across the wafer surface during imprinting. The system not only enables ​​residual-layer-free nanoimprinting​​ but also ​​minimizes particle-induced defects​​ while preserving the integrity of nanostructures, and supports ​​curved-surface imprinting processes​​.

​​To meet diverse customer needs​​, we provide ​​customized solutions​​, developing dedicated functional modules tailored to specific application requirements.