​​Nanoimprint Inventor Stephen Y. Chou Visits PRINANO: Advancing Authentic NIL Technology for Next-Generation Manufacturing​

In mid-May 2024, Professor Stephen Y. Chou—inventor of nanoimprint lithography (NIL), member of the US National Academy of Engineering, Joseph Elgin Professor at Princeton University, and Einstein Professor of the Chinese Academy of Sciences—visited PRINANO Technology. During his visit, he toured the company’s new facility and reviewed the latest advancements in PRINANO’s NIL technology.

Nanoimprint lithography is a versatile micro-nano fabrication technology that transfers nanostructures from a template to a substrate using specialized resins. It now achieves Ångstrom-level precision (sub-nanometer resolution), surpassing traditional photolithography. Originally invented by Professor Chou in 1995, NIL was later recognized by MIT Technology Reviewas one of the "technologies that will change the world in the coming decades."

Professor Chou emphasized that NIL is a highly innovative and groundbreaking approach to micro-nano fabrication, offering unique advantages in 3D structuring, large-area patterning, and material versatility unmatched by other techniques. He noted that NIL has revolutionary potential for both R&D and commercial applications. His contributions to nanotechnology and materials science have globally impacted semiconductors, optoelectronics, life sciences, and new energy technologies.

Founded in 2017, PRINANO aims to become a globally leading high-end micro-nano manufacturer with full-stack NIL capabilities—spanning equipment, materials, and application-specific processes. The founding team trained under Professor Chou, bringing deep expertise in NIL.

During the tour led by PRINANO’s CEO, Professor Chou visited the R&D center and production workshops, discussing strategic plans and technical progress with the team. He also took a commemorative photo with company leadership at the newly constructed NIL R&D center.

PRINANO’s technical lead reported on recent breakthroughs in NIL equipment, materials, and applications. Professor Chou was impressed by the team’s focus, dedication, and rapid progress. He remarked that while NIL appears simple, its execution requires extreme precision: "The devil is in the details, and the know-how rivals even advanced photolithography. Mastering NIL demands craftsmanship and undivided attention."

After the seminar, students from Nanjing University’s NIL Lab engaged with Professor Chou, receiving personalized feedback and guidance on their research directions.

This visit injected new momentum into PRINANO’s innovation journey, marking a significant milestone. PRINANO is committed to advancing authentic NIL technology and serving downstream industries with reliable, high-performance solutions.