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PRINANO Wraps Up Successful Showcase at CIOE 2025Issuing time:2025-09-16 17:03 From September 10-12, 2025, PRINANO Technology made a groundbreaking showcase at the 26th China International Optoelectronic Exposition (CIOE), unveiling China's first semiconductor-grade nanoimprint lithography (NIL) system. The exhibition attracted industry professionals from semiconductors, AR/VR, and related high- tech fields, demonstrating PRINANO's leadership in advanced nanofabrication technologies. Exhibition Highlights Recap    
Highlight Moments Dr. Guo Ziping, Secretary of the Party Leadership Group and Director-General of the Shenzhen Development and Reform Commission, visited PRINANO's booth for an inspection. During the visit, PRINANO CEO Deng Mengmeng introduced Dr. Guo to the company's technological advancements and developments in nanoimprint lithography (NIL) for high-end semiconductor and optoelectronic applications. Dr. Guo highly praised PRINANO's "full-cycle solution from materials to processes", recognizing its innovative approach and industry impact.
Dr. Guo Ziping (3rd from left) with PRINANO CEO Deng Mengmeng (1st from right)
Dr. Guo Ziping (2nd from left) in conversation with PRINANO CEO Deng Mengmeng (1st from right) A Successful Conclusion, A New Journey Ahead PRINANO Technology will take this exhibition as a new starting point to further advance nanoimprint technology. Let us meet again at CIOE 2026 in Shenzhen, this city of innovation, to continue exploring breakthroughs and industrial applications of nanoimprint technology. PRINANO looks forward to reuniting with you!  |
